Chrome Photomask Customization
Chrome mask is mainly used for lithography exposure operation in MEMS process. On the chrome mask, some graphic areas are transparent and some are opaque. In the lithography process, the sensitive light of UV or other photoresist passes through the chromium mask and irradiates to the photoresist layer on the surface of the substrate, thus realizing the exposure operation of the photoresist and the transfer of the pattern. In the field of microfluidic chip processing, chromium glass mask is needed to process PDMS microfluidic chip and glass microfluidic chip. Alfa Chemistry provides customized services, and can customize chrome masks according to customer drawings.
Manufacturing Process
The production of chrome photomasks involves several stages, including mask design, mask writing, and mask inspection.
- Mask Design
The initial phase of mask design, a complex and multifaceted process, involves the use of computer-aided design (CAD) software to transpose the designer's vision into a tangible creation.
- Mask Writing
Following this, the mask design is transferred onto a glass plate with a photosensitive coating known as a resist, marking the onset of the enigmatic and infinitely complex process of mask writing. This elusive stage, replete with nuance and subtlety, employs an electron or laser beam to cause a chemical reaction in the resist, thereby removing it from specific areas. The resist is then developed, leaving a patterned layer on the glass plate.
- Mask Inspection
Finally, the patterned glass plate undergoes a thorough inspection. The glass plate, a delicate and ephemeral creation, must meet stringent specifications, and any detected defects require immediate repair.
Advantages
- Fine Lines
- Sharp Edge
- Uniform Etching
- Easy to Process
- Resistance to Environmental Change
- High Hardness and Scratch Resistance
- Durable
What can We Offer
- Customization
Our offerings are steeped in a sense of awe-inspiring grandeur, with customized services that cater to the capricious and mercurial demands of our esteemed clients. Our experts, veritable alchemists of their craft, toil tirelessly to create custom designs, develop unique specifications, and optimize the photomask fabrication process, ensuring that each creation is an unparalleled masterpiece of the photomask production industry.
- High Precision
High precision is the very essence of our photomask production process, an attribute that is the very cornerstone of our success in this industry. Our state-of-the-art equipment and technology enable us to produce photomasks with peerless pattern resolution, low defect density, and indomitable long-term durability.
- Quality Control
We have stringent quality control measures in place throughout the photomask production process, with our Quality-by-Design (QbD) and process analytical techniques (PAT) ensuring that each photomask meets the highest standards of quality and accuracy.
Reference
- Lee, S. H.; et al. Single photomask lithography for shape modulation of micropatterns. Journal of Industrial and Engineering Chemistry 84 (2020): 196-201.
Our products and services are for research use only.
