SU-8 Developer

SU-8 developer is a chemical solution used in the SU-8 lithography process to dissolve the unexposed photoresist. When the substrate is placed in the developer, the unexposed photoresist is dissolved by the developer. While the exposed photoresist has been crosslinked to form a reticulated polymer, the developer has virtually no dissolving effect on it, forming a microstructured pattern opposite to that of the mask plate.

Alfa Chemistry offers SU-8 developer that is universal for different types of SU-8 photoresists.


Content of 1-methoxy-2-propyl acetate98-100%
AppearanceViscous pale yellow to yellow liquid
OdorFruity, ester-like
Specific gravity0.969
Boiling point150°C
Autoignition temperature354°C
Explosion limitsLower: 1.3%; Upper: 13.1%
Vapor pressure3.7 mm Hg @ 20°C
Evaporation rate0.39 (BuAc = 1)
H2O solubilityAppreciable

Direction for Use

For different thicknesses of photoresist, refer to the following table to select the development time.

Photoresist thickness (μm)Development time (min)Photoresist thickness (μm)Development time (min)

Storage and Handling Precautions

Storage: Store in original, well-closed container in a cool dry place.

Handling: Keep away from heat, sparks, and flames.

Avoid breathing vapors.
Use with adequate ventilation.
Avoid contact with skin, eyes, and clothing. Have available safety shower and eyewash.
Wear impervious butyl or nitrile gloves.
Wash with soap and water after handling.

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Our products and services are for research use only.

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